Resist processing method

Details Resist processing method Resist processing method

1994-08-25

1996-05-14

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Post imaging radiant energy exposure

430327, 430330, 430494, 430269, 437174, 437247, 437949, G03C 500, G03C 504, H01L 21306, H01L 21324

Patent

active

055166261

ABSTRACT:
The present invention relates to a resist processing device and resist processing method that enable resist pattern formation with a high degree of accuracy, and furthermore, enable in continuous dry etching, an isotropic etching possessing extremely high selectivity. The resist processing device is provided with at least a mechanism for the radiation of ultraviolet rays onto a substrate having a resist formed thereon, and a mechanism for the introduction of inert gas into the device. The resist processing method is characterized in that the radiation of ultraviolet rays onto a substrate which has a resist form thereon is conducted in an inert gas atmosphere.

REFERENCES:
patent: 3887440 (1975-06-01), Ichioka
patent: 4615776 (1986-10-01), Sasaki et al.
patent: 4765055 (1988-08-01), Ozaki et al.
patent: 4786947 (1988-11-01), Kosugi et al.

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