Resist processing apparatus, substrate processing apparatus and

Coating apparatus – Control means responsive to a randomly occurring sensed...

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118712, 118 52, 118 56, 118500, 414935, 134902, B05C 1300

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active

056266758

ABSTRACT:
A substrate processing apparatus has an article transferring unit for transferring articles, and an arm assembly is provided on the transferring unit. Each arm of the arm assembly is provided with pawls for contacting and supporting undersurface portions of the peripheral side wall of each of the articles, and one or more sucking portions are provided on the upper surface of the arm and are disposed above the corresponding pawl or pawls. The pawls, or the sucking portion or sucking portions are selected for every process, and supporting or holding of each of the articles and the required transfer of each of the articles are performed. The transfer can be performed by changing the operating range of each of the arms without replacing the arms. Taking each of the articles in and out of the processing units are carried out smoothly and a series of processes are achieve efficiently.

REFERENCES:
patent: 4985722 (1991-01-01), Ushijima et al.
patent: 5061144 (1991-10-01), Akimoto et al.
patent: 5297910 (1994-03-01), Yoshioka et al.
patent: 5364222 (1994-11-01), Akimoto et al.

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