Metal working – Barrier layer or semiconductor device making
Patent
1995-04-26
1998-09-08
Graybill, David
Metal working
Barrier layer or semiconductor device making
118500, B65G 4907, B05C 1302
Patent
active
058039325
ABSTRACT:
A processing system comprising a loading/unloading section, a processing section and an interface section. The system further comprises a convey mechanism and at least two waiting sections. The convey mechanism can move in either direction between between the loading/unloading section and the interface section, for conveying objects to the processing units included in the processing section and conveying objects in either direction between the loading/unloading section and the interface section. The waiting sections are provided for temporarily holding an object before the convey mechanism conveys an object to the interface section.
REFERENCES:
patent: 5297910 (1994-03-01), Yoshioka et al.
patent: 5434644 (1995-07-01), Kitano et al.
patent: 5442416 (1995-08-01), Tateyama et al.
patent: 5565034 (1996-10-01), Nanbu et al.
Akimoto Masami
Nagano Toshihiko
Ogawa Shizuo
Graybill David
Tokyo Electron Kyushu Limited
Tokyo Electron Limited
LandOfFree
Resist processing apparatus having an interface section includin does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Resist processing apparatus having an interface section includin, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Resist processing apparatus having an interface section includin will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1277755