Resist process using anti-reflective coating

Details Resist process using anti-reflective coating Resist process using anti-reflective coating

1984-06-01

1985-12-10

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

148187, 156652, 156655, 156656, 1566611, 156904, 204192E, 427 431, 430312, 430318, B44C 122, C03C 1500, C03C 2506, C23F 102

Patent

active

045577978

ABSTRACT:
The present invention teaches a two-and-one-half-level resist process, wherein a first planarizing resist layer is applied, an anti-reflective coating (which need not be a photoresist itself) is applied, and then a top photoresist layer is applied. The top layer is patterned conventionally, at a wavelength which the anti-reflective coating absorbs, and a flood exposure (preferably in deep ultraviolet light) is then used to transfer this pattern to the bottom planarizing resist layer. Good patterning of non-planar surfaces despite topography is thus achieved, and pattern degradation due to spurious reflections (e.g., from an aluminum layer being patterned) is avoided.

REFERENCES:
patent: 4244799 (1981-01-01), Fraser et al.
patent: 4288283 (1981-09-01), Umezaki et al.
patent: 4341850 (1982-07-01), Coane
patent: 4370405 (1983-01-01), O'Toole et al.

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