Resist process system

Material or article handling – Apparatus particularly adapted for charging or discharging a... – With means to transfer – or facilitate transfer of – vehicle...

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Details

414217, 432121, G03D 504, B65G 106, F27B 900

Patent

active

052027163

ABSTRACT:
A resist process system of the present invention includes at least two robots for conveying a wafer, a passage through which the robots can move, plural process units arranged along the passage, and a waiting unit for temporarily holding the wafer which is to be processed. The waiting unit is arranged beside the passage and between the process units and it includes plural compartments partitioned in it.

REFERENCES:
patent: 4764076 (1988-08-01), Layman et al.
patent: 4917556 (1990-04-01), Stark et al.
patent: 5015177 (1991-05-01), Iwata

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