Resist polymer and resist composition

Details Resist polymer and resist composition Resist polymer and resist composition

2004-01-29

2009-08-18

Lee, Sin J. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S910000, C430S326000, C526S297000, C526S298000, C526S281000, C526S282000, C526S270000

Reexamination Certificate

active

07575846

ABSTRACT:
The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.

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U.S. Appl. No. 11/596,865, filed Nov. 17, 2006, Ootake et al.

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