Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-01-07
1998-11-03
Richter, Johann
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430 5, 430313, 430326, 558 44, 558 58, G03F 7004
Patent
active
058306196
ABSTRACT:
Photoacid generators advantageous for use in applications such as photoacid generators used in chemically amplified resists are disclosed. These compounds are based on an ortho nitro benzyl configuration employing an .alpha. substituent having high bulk, steric characteristics, and electron withdrawing ability. The enhanced efficacy is particularly found in compounds both having a suitable .alpha. substituent and a second ortho substituent with large electron withdrawing and steric effects.
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"Chemical Amplification Mechanisms for Microlithography", by Reichmanis, E. et al.
Chin Evelyn
Houlihan Francis Michael
Nalamasu Omkaram
Lucent Technologies - Inc.
Richter Johann
Rittman Scott J.
Stockton Laura L.
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