Resist material and process for use

Details Resist material and process for use Resist material and process for use

1992-02-18

1993-05-18

Schofer, Joseph L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430281, 430286, 522121, 522122, 522154, G03C 176

Patent

active

052120473

ABSTRACT:
Excellent resolution and sensitivity in the patterning of resists utilized in device and mask manufacture is obtained with a specific composition. In particular this composition involves polymers having recurring pendant acid labile .alpha.-alkoxyalkyl carboxylic acid ester moieties in the presence of an acid generator activated by actinic radiation such as UV-visible, deep ultraviolet, e-beam and x-ray radiation.

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C. G. Willson, et al., "Resist Mat'ls For Microelectronics", ChemTech, pp. 102-111 (1989), Willson, et al. pp. 182-189.
J. V. Crivello, Polymeric Mat'ls Science and Engineering Preprints, vol. 61, Amer. Chem. Soc. Meeting, Sep. 1989, pp. 62-66.
J. E. Kearns, et al., J. Macromol. Sci-Chem., 198 (4), 673 (1974).

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