Resist material and method of manufacturing inkjet recording...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article

Reexamination Certificate

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C216S027000, C430S270100, C526S316000

Reexamination Certificate

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06986982

ABSTRACT:
Provided is a resist material that comprises a polymer compound represented by the following general formula (I):where R1and R2are each independently a hydrogen atom or an alkyl group; R3and R4are each independently an alkyl group; m and n are positive integers.

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