Resist material

Details Resist material Resist material

1996-01-30

1997-09-09

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

G03F 7038, G03F 7039

Patent

active

056655193

ABSTRACT:
A vertically orienting compound is added to a chemical amplification type resist to progress acid catalysis during baking after exposure and penetration of a developer in a developing step in the direction of depth of the resist. This improves the resist shape, the dimensional uniformity, and the resolving power in a lithography step.

REFERENCES:
patent: 4983479 (1991-01-01), Broer et al.
patent: 4996123 (1991-02-01), Nomura et al.
J.W. Thackeray et al., "Deep UV ANR Photoresists For 248 nm Excimer Laser Photolithography", SPIE vol. 1086 Advances in Resist Technology and Processing VI (1989), pp. 34-47.
C.G. Willson et al., "Approaches to the Design of . . . Improved Sensitivity and Resolution", J. Electrochem. Soc.: Solid-State Science and Technology, vol. 133, No. 1, Jan. 1986, pp. 181-187.
H. Ito et al., "Applications of Photoinitiators to the Design of Resists for Semiconductor Manufacturing", Polymers in Electronics, 1983, pp. 11-23.
R.A.M. Hikmet et al., Polymer, 1993, vol. 34, No. 8, pp. 1736-1740. No month given.

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