Resist for use in forming a positive pattern with a radiation an

Details Resist for use in forming a positive pattern with a radiation an Resist for use in forming a positive pattern with a radiation an

1980-09-22

1982-08-24

Newsome, John H.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

427 431, B05D 306

Patent

active

043461638

ABSTRACT:
1. A resist for use in forming a positive pattern with a radiation comprising a copolymer composed of methyl methacrylate and methacrylic acid and a cross-linking agent having the following general formula: ##STR1## wherein R is H or CH.sub.3, x is an integer of 1 to 9, and y and z are zero, or an integer of 1 to 3.
2. A process for forming a positive pattern on a substrate with a radiation.

REFERENCES:
patent: 3914462 (1975-10-01), Morishita et al.
patent: 3943187 (1976-03-01), Wu
patent: 3981985 (1976-09-01), Roberts
patent: 3984582 (1976-10-01), Feder et al.
patent: 4087569 (1978-05-01), Hatzakis

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