Resist for soft mold and method for fabricating liquid...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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Details

C430S020000, C430S322000, C430S281100, C428S001100, C428S001200

Reexamination Certificate

active

07838196

ABSTRACT:
A soft mold resist for soft-lithography, a method for fabricating a soft mold, and a method for fabricating a liquid crystal display (LCD) device using the same where the soft mold includes a hydrophilic liquid prepolymer, a photoinitiator; and a surface active agent. A soft mold is formed by applying the soft mold resist to a back plate or a master plate and transferring a predefined pattern from the master plate to the soft mold resist. A display is formed by applying the soft mold to an etch resist layer overlying a thin film and transferring the predefined pattern to the etch resist, then etching the thin film using the etch resist as a mask. Additional processing step are carried out to form the LCD device.

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