Resist for printing and patterning method using the same

Details Resist for printing and patterning method using the same Resist for printing and patterning method using the same

2011-08-30

2011-08-30

Walke, Amanda C. (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S007000, C430S311000, C430S396000, C430S322000

Reexamination Certificate

active

08007980

ABSTRACT:
A resist for printing that is coated on a printing roll and is then sequentially transcribed on a printing plate and a substrate including: a material wherein a cohesive energy between the resist and the printing plate is larger than a cohesive energy between the resist and a blanket formed on the surface of printing roll, and wherein a cohesive energy between the resist and the substrate is larger than the cohesive energy between the resist and the blanket formed on the surface of printing roll.

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Lee, et al.;Solvent Compatibility of Poly(dimethylsiloxane)-Based Microfluidic Device; Analytical Chemistry, vol. 75, No. 23, Dec. 1, 2003; pp. 6544-6554.

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