Resist developing apparatus and resist developing method

Details Resist developing apparatus and resist developing method Resist developing apparatus and resist developing method

1997-03-04

1998-10-13

Lee, Hoa Van

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430313, 430319, G03F 730

Patent

active

058210350

ABSTRACT:
A developing apparatus used for developing a resist applied on a substrate, comprises: developer storage means for storing a developer; a developer supply tube for supplying the developer from the developer storage means through one end thereof onto a substrate supported in a position; and degas means located immediately upstream of the one end of the developer supply tube to deaerate the developer. A resist developing method comprises the steps of: supplying a substance; applying a resist onto the substrate; making a latest image in the resist; and supplying a developer onto the resist having the latest image to develop the resist, wherein the step of supplying the developer provides the developer in several times. Another resist developing method comprises the steps of: supplying a substrate; applying a resist onto the substrate; forming a latest image in the resist; providing a developer onto the resist having the latest image therein; after providing the developer, rotating the substrate and then stopping same; maintaining the substrate still; and rotating the substrate and then stopping same.

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