Resist compounds including acid labile groups having...

Details Resist compounds including acid labile groups having... Resist compounds including acid labile groups having...

2006-12-12

2006-12-12

Lee, Sin (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S330000, C430S905000, C430S910000, C526S286000

Reexamination Certificate

active

07147985

ABSTRACT:
A compound including a polymeric chain, an acid labile group attached to the polymeric chain, and at least one hydrophilic group attached to the acid labile group is disclosed. Compositions including the compound, and methods of using the compositions are also disclosed.

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Takechi, Satoshi, et al., “Impact of 2-Methyl-2-Adamantyl Group Used for 193-nm Single Layer Resist”, Journal of Photopolymer Science and Technology, vol. 9, No. 3 (1996) pp. 475-488.
Koji Nozaki, et al. and Akiko Kotachi et al., “A Novel Polymer for A 193-nm Resist”, Journal of Photopolymer Science and Technology, vol. 9, No. 3 (1996) pp. 509-522.

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