Resist compounds including acid labile groups attached to...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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Details

C430S325000, C430S326000, C430S330000, C430S434000, C430S494000

Reexamination Certificate

active

07147986

ABSTRACT:
A compound including a polymeric chain, and an acid labile group attached to the polymeric chain at an anhydride linkage is disclosed. Compositions including the compound, and methods of using the compositions are also disclosed.

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patent: 2005/0147916 (2005-07-01), Yueh et al.

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