Resist compositions comprising a phenolic resin, an acid forming

Details Resist compositions comprising a phenolic resin, an acid forming Resist compositions comprising a phenolic resin, an acid forming

1992-05-13

1994-05-10

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430326, 430330, 430905, 430907, 430914, 430921, G03F 7004, G03F 740

Patent

active

053106199

ABSTRACT:
A positive photoresist composition is provided which can be used in the presence or absence of atmospheric moisture. There is used a major amount of a commercially available resin, such as a novolak, a dissolution inhibitor with thermally labile t-butyl ether or ester groups, and an aryl onium salt.

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