Resist compositions and patterning process

Details Resist compositions and patterning process Resist compositions and patterning process

2006-09-12

2006-09-12

Walke, Amanda (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S905000, C430S907000, C430S914000, C430S921000

Reexamination Certificate

active

07105267

ABSTRACT:
In a resist composition comprising a base resin which is a high molecular weight structure free from an aromatic substituent group, a photoacid generator, and a solvent, the photoacid generator is a one capable of generating a perfluoroalkyl ether sulfonic acid. The resist composition has many advantages including excellent resolution, minimized size difference between isolated and densely packed patterns, and minimized line edge roughness.

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English Language abstract of DE 295421.

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