Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-12-25
2007-12-25
Chu, John S. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S905000, C430S910000
Reexamination Certificate
active
10480794
ABSTRACT:
The present invention relates to a resist composition for practical use with high resolution, high sensitivity, superior pattern profile and no outgas in energy irradiation under high vacuum, suitable to an ultra-fine processing technology represented by use of electron beam and the like, and provides: (1) a resist composition comprising at least one kind of polymer containing, as components thereof, a monomer unit represented by the following general formula [1]:a monomer unit represented by the following general formula [2]:and a monomer unit represented by the following general formula [3]:at least one kind of compound to generate an acid by irradiation of radioactive ray, represented by the following general formula [4]; an organic basic compound; and a solvent, (2) the resist composition in accordance with (1), further containing a polymer unit represented by the following general formula [13]:and, (3) the resist composition in accordance with (1) and (2), further containing a compound represented by the following general formula [4]:as a compound to generate an acid by irradiation of radioactive ray.
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Maesawa Tsuneaki
Urano Fumiyoshi
Chu John S.
Kratz Quintos & Hanson, LLP
Wako Pure Chemical Industries Ltd.
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