Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-02-22
2005-02-22
Walke, Amanda (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S311000, C430S942000, C430S966000
Reexamination Certificate
active
06858372
ABSTRACT:
A resist composition with enhanced X-ray and electron sensitivity includes a plurality of chemically inert nanoparticles dispersed throughout a base resist material. The nanoparticles have a higher atomic number than the base resist material and each of the nanoparticles is formed by a nanoparticle core, e.g., of a noble metal, coated with an organic capping layer or shell. The latter renders the core dispersible and chemically compatible with the resist material surrounding the nanoparticle. A method of making a resist composition with enhanced X-ray and electron sensitivity is to provide a resist material and disperse chemically inert nanoparticles throughout the resist. The nanoparticles have a higher atomic number than the resist and a have core/shell structure. A resist composition with enhanced X-ray and electron sensitivity can be made by having a nanoparticle core, with a higher atomic number than the resist, that is coated with an organic capping layer. The nanoparticle with the core/shell structure is then dispersed throughout the resist material.
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Dozier Charles M.
Lambrakos Samuel G.
Snow Arthur
Whitlock Robert R.
Hunnius Stephen T.
Karasek John J.
The United States of America as represented by the Secretary of
Walke Amanda
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