Resist composition for electron beam, X-ray, or EUV, and...

Details Resist composition for electron beam, X-ray, or EUV, and... Resist composition for electron beam, X-ray, or EUV, and...

2008-08-01

2011-12-27

Lee, Sin J. (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S905000, C430S922000, C430S942000, C430S966000

Reexamination Certificate

active

08084183

ABSTRACT:
A positive resist composition for electron beam, X-ray or EUV includes (A) a compound represented by the following formula (I), and (B) a resin capable of decomposing by the action of an acid to increase solubility in an alkali developing solution, which includes a repeating unit represented by the following formula (II) and a repeating unit represented by the following formula (III):

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European Patent Office communication dated May 11, 2010, issued in European Patent Application No. 08013855.5-1226.

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