Resist composition for electron beam or EUV

Details Resist composition for electron beam or EUV Resist composition for electron beam or EUV

2004-10-20

2008-08-05

Walke, Amanda C. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S311000, C430S913000, C430S917000, C430S919000

Reexamination Certificate

active

07407734

ABSTRACT:
A resist composition and a method of forming a resist pattern that enable contamination within the exposure apparatus to be prevented in lithography processes using an electron beam or EUV (extreme ultraviolet light). In this method, an organic solvent containing, as the principal component, one or more compounds selected from a group consisting of propylene glycol monomethyl ether (PGME), methyl amyl ketone (MAK), butyl acetate (BuOAc), and 3-methyl methoxy propionate (MMP) is used as the resist solvent.

REFERENCES:
patent: 6492086 (2002-12-01), Barclay et al.
patent: 6548220 (2003-04-01), Uetani et al.
patent: 6576392 (2003-06-01), Sato et al.
patent: 6767688 (2004-07-01), Teng et al.
patent: 6787286 (2004-09-01), Szmanda et al.
patent: 6849374 (2005-02-01), Cameron et al.
patent: 6855485 (2005-02-01), Irie
patent: 6927009 (2005-08-01), Kodama et al.
patent: 6966710 (2005-11-01), Irie
patent: 7255971 (2007-08-01), Fujimori et al.
patent: 2003/0017425 (2003-01-01), Endo et al.
patent: 2003/0082486 (2003-05-01), Endo et al.
patent: 2003/0138727 (2003-07-01), Kawabe et al.
patent: 2003/0180659 (2003-09-01), Takata et al.
patent: 2004/0009429 (2004-01-01), Sato
patent: 0562819 (1993-09-01), None
patent: 09-281696 (1997-10-01), None
patent: 11-212265 (1999-08-01), None
patent: 2001-142212 (2001-05-01), None
patent: 2002-014470 (2002-01-01), None
patent: 2002-023375 (2002-01-01), None
patent: 2002-202606 (2002-07-01), None
patent: 2002-236364 (2002-08-01), None
patent: 2003-075998 (2003-03-01), None
patent: 2003-140361 (2003-05-01), None
patent: 2003-177537 (2003-06-01), None
patent: 2003-206315 (2003-07-01), None
patent: 2003-241384 (2003-08-01), None
patent: 2003-270790 (2003-09-01), None
patent: 2003-280202 (2003-10-01), None

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