Resist composition for deep ultraviolet light

Details Resist composition for deep ultraviolet light Resist composition for deep ultraviolet light

1996-08-26

1997-12-09

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430170, 430512, 430905, 430926, 430927, G03C 152, G03F 7039

Patent

active

056959109

ABSTRACT:
A resist composition for deep ultraviolet light comprising (a) one of the following resin components (i)-(iii): (i) a resin which becomes alkali-soluble by eliminating protective groups by the action of an acid, (ii) a combination of an alkali-soluble resin and a dissolution-inhibiting compound, and (iii) a combination of an alkali-soluble resin and a crosslinkable compound, (b) an acid generater, (c) a special anthracene derivative, and (d) a solvent, is suitable for forming a pattern using deep ultraviolet light, KrF excimer laser light, etc., on a highly reflective substrate having level differences due to absorption of undesirable reflected deep ultraviolet light.

REFERENCES:
patent: 5059512 (1991-10-01), Babich et al.
patent: 5250395 (1993-10-01), Allen et al.
patent: 5272042 (1993-12-01), Allen et al.
patent: 5376498 (1994-12-01), Kajita et al.
Chemical Abstract, vol. 105; 25881n, 1986.

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