Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-07-10
2007-07-10
Walke, Amanda (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S905000, C522S168000, C522S181000, C522S182000
Reexamination Certificate
active
10909384
ABSTRACT:
A resist composition includes a photoacid generator (PAG) and a photosensitive polymer. The photosensitive polymer is polymerized with (a) at least one of the monomers having the respective formulae:where R1 and R2 are independently a hydrogen atom, alkyl, hydroxyalkyl, alkyloxy, carbonyl or ester, and x and y are independently integers from 1 to 6, and (b) at least one of a (meth)acrylate monomer, a maleic anhydride monomer, and a norbornene monomer.
REFERENCES:
patent: 5814432 (1998-09-01), Kobayashi
patent: 5843624 (1998-12-01), Houlihan et al.
patent: 6018559 (2000-02-01), Brandenburg et al.
patent: 6280897 (2001-08-01), Asakawa et al.
patent: 6303266 (2001-10-01), Okino et al.
patent: 6313318 (2001-11-01), Coulson et al.
patent: 6461791 (2002-10-01), Hatakeyama et al.
patent: 6537727 (2003-03-01), Yoon et al.
patent: 6642346 (2003-11-01), Brandenburg et al.
patent: 6835525 (2004-12-01), Nishi et al.
patent: 6849376 (2005-02-01), Barclay et al.
patent: 2002/0028881 (2002-03-01), Brandenburg et al.
patent: 2002/0150835 (2002-10-01), Nishi et al.
patent: 2002/0155379 (2002-10-01), Yoon et al.
patent: 2003/0031949 (2003-02-01), Barclay et al.
patent: 2003/0130414 (2003-07-01), Brandenburg et al.
patent: 2005/0079438 (2005-04-01), Cao et al.
patent: 09033736 (1997-02-01), None
patent: 09033736 (1997-02-01), None
patent: 2000-26446 (2000-01-01), None
English language machine translation of JP 09-033736.
Akiko Kotachi et al., “A Novel Polymer for a 193-nm Resist,” Journal of Photopolymer Science and Technology, vol. No. 3 (1996) pp. 509-522.
Mikio Yamachika et al., “Improvement of Post-Exposure Dealy Stability in Alicylic ArF Excimer Photoresists,” Journal of Photopolymer Science and Technology, vol. 12, Number 4 (1999) pp. 553-559.
Naomi Shida et al., “advanced Materisla for 193-nm Resists,” Journal of Photopolymer Science and Technology, vol. 13, No. 4 (2000) pp. 691-696.
Poskonin et al., “Studies on Substituted Butane and Butenollides, XIII, Synthesis of Copolymers of 4-Acetoxy-2-Butenolide and Vinyl Compounds,” Russion Journal of Organic Chemistry, vol. 33, No. 4, 1997, pp. 520-523, translated by Zhurnal Organischeskoi.
Poskonin et al., “Studies on Substituted Butane and Butenoilides, XIV, Synthesis of High Molecular Butanolides on the Basis of 4-Alkoxy-2-butenolides and Vinyl Monomers,” Russion Journal of Organic Chemistry, vol. 35, No. 5, 1999, pp. 721-726, translated by Zhurnal Organischeskoi.
Choi Sang-jun
Jung Dong-won
Kim Hyun-woo
Lee Si-hyeung
Lee Sook
Volentine & Whitt PLLC
Walke Amanda
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