Resist composition and patterning process

Details Resist composition and patterning process Resist composition and patterning process

2008-03-21

2009-10-06

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S330000, C430S907000, C430S910000, C430S919000, C430S920000

Reexamination Certificate

active

07598016

ABSTRACT:
To a resist composition comprising a polymer which changes its alkali solubility under the action of an acid as a base resin, is added a copolymer comprising recurring units containing a carboxylic acid ammonium salt and recurring units containing at least one fluorine atom as an additive. The composition is suited for immersion lithography.

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