Resist composition and patterning process

Details Resist composition and patterning process Resist composition and patterning process

2007-09-11

2007-09-11

Walke, Amanda (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C525S344000

Reexamination Certificate

active

10852157

ABSTRACT:
Resist compositions comprising as the base resin a polymer having alkoxyisobutoxy as a reactive group which is decomposable under the action of an acid to increase solubility in alkali have advantages including a significantly enhanced contrast of alkali dissolution rate before and after exposure, a high sensitivity, and a high resolution in fine feature size regions. The compositions are best suited as a chemically amplified resist material for micropatterning in the manufacture of VLSI.

REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 4603101 (1986-07-01), Crivello
patent: 5252435 (1993-10-01), Tani et al.
patent: 5310619 (1994-05-01), Crivello et al.
patent: 5324804 (1994-06-01), Steinmann
patent: 5770343 (1998-06-01), Sato et al.
patent: 5874195 (1999-02-01), Sato et al.
patent: 5976759 (1999-11-01), Urano et al.
patent: 6656660 (2003-12-01), Urano et al.
patent: 6756179 (2004-06-01), Fujimori et al.
patent: 908473 (1999-04-01), None
patent: 1039346 (2000-09-01), None
patent: 1308782 (2003-05-01), None
patent: 62-115440 (1987-05-01), None
patent: 63-27829 (1988-02-01), None
patent: 2-27660 (1990-01-01), None
patent: 3-223858 (1991-10-01), None
patent: 3-275149 (1991-12-01), None
patent: 4-211258 (1992-08-01), None
patent: 6-100488 (1994-04-01), None
patent: 6-289608 (1994-10-01), None
patent: 2003084440 (2003-02-01), None
patent: 2003140350 (2003-05-01), None

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