Resist composition and pattern forming method using the same

Details Resist composition and pattern forming method using the same Resist composition and pattern forming method using the same

2009-03-25

2011-12-27

Walke, Amanda C. (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S912000, C430S913000

Reexamination Certificate

active

08084187

ABSTRACT:
Provided is a resist composition including a compound having a molecular weight of 1,000 or less and containing at least one sulfonamide group (—SO2NH—).

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Machine translation of JP 11-44590 (no date).

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