Resist composition and pattern-forming method using the same

Details Resist composition and pattern-forming method using the same Resist composition and pattern-forming method using the same

2011-08-02

2011-08-02

Lee, Sin J. (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S311000, C430S326000, C430S905000, C430S910000

Reexamination Certificate

active

07989137

ABSTRACT:
A resist composition includes (A) a resin including: a repeating unit capable of decomposing by the action of an acid to increase solubility in an alkali developing solution and represented by formula (I), and a repeating unit represented by formula (II); and (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation:wherein A represents a hydrogen atom, an alkyl group, a hydroxyl group, an alkoxyl group, a halogen atom, a cyano group, a nitro group, an acyl group, an acyloxy group, a cycloalkyl group, an aryl group, a carboxyl group, an alkyloxycarbonyl group, an alkylcarbonyloxy group, or an aralkyl group; Ra represents a group containing a group capable of decomposing by the action of an acid; Rb represents an alkylene group, a cycloalkylene group, or a group of combining these groups; Y represents a heterocyclic group; and m represents 0 or 1.

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Derwent Englsih abstract for JP2002-131915.
Machine-assisted English translation of JP2002-131915 as provided by JPO.
Extended European Search Report dated May 7, 2009.

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