Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2011-03-29
2011-03-29
Hamilton, Cynthia (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S915000, C430S325000, C430S326000, C430S175000, C522S031000, C522S032000
Reexamination Certificate
active
07914965
ABSTRACT:
A resist composition comprises (A) a compound having a molecular weight of 3,000 or lower which has in its molecule a structure having two or more monovalent anions and a structure having two or more monovalent cations.
REFERENCES:
patent: 3976822 (1976-08-01), Thomas et al.
patent: 4288562 (1981-09-01), Kresta et al.
patent: 5347040 (1994-09-01), Reiser et al.
patent: 5527655 (1996-06-01), Bonham et al.
patent: 6410204 (2002-06-01), Kodama et al.
patent: 6479211 (2002-11-01), Sato et al.
patent: 7189492 (2007-03-01), Kodama et al.
patent: 2002/0058200 (2002-05-01), Fujimori et al.
patent: 2003/0017411 (2003-01-01), Shimada et al.
patent: 2004/0005513 (2004-01-01), Takahashi et al.
patent: 2004/0180289 (2004-09-01), Shimada et al.
patent: 2004/0185373 (2004-09-01), Kodama
patent: 2004/0234888 (2004-11-01), Lamanna
patent: 2005/0064326 (2005-03-01), Yasunami et al.
patent: 0 869 393 (1998-10-01), None
patent: 1 517 179 (2005-03-01), None
patent: 6-263720 (1994-09-01), None
patent: 10-39500 (1998-02-01), None
patent: 2002-128831 (2002-05-01), None
patent: 2002-268217 (2002-09-01), None
patent: 2003-342254 (2003-12-01), None
patent: 2004-86188 (2004-03-01), None
patent: WO 97/22910 (1997-06-01), None
patent: WO 02/082185 (2002-10-01), None
patent: WO 2004/107051 (2004-12-01), None
English translation of JP, 2003-342254, A (2003) from machine translation from AIPN Japan Patent Office National center for Industrial Property Information and Training, generated Jan. 18, 2010, 15 pages.
European Search Report dated May 30, 2006.
Japanese Office Action dated Jul. 15, 2009.
Takahashi Hyou
Wada Kenji
FUJIFILM Corporation
Hamilton Cynthia
Sughrue & Mion, PLLC
LandOfFree
Resist composition and method of pattern formation with the... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Resist composition and method of pattern formation with the..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Resist composition and method of pattern formation with the... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2643151