Resist composition and method of forming resist pattern

Details Resist composition and method of forming resist pattern Resist composition and method of forming resist pattern

2008-10-08

2011-10-04

Walke, Amanda C. (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S913000, C430S919000

Reexamination Certificate

active

08029972

ABSTRACT:
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid, an acid-generator component (B) which generates acid upon exposure, and a nitrogen-containing organic compound (D1) having a molecular weight of 200 or more, which is represented by general formula (d1) shown below (wherein each of R1to R3independently represents a hydrocarbon group which may have a substituent, with the proviso that at least one of R1to R3is a polar group-containing hydrocarbon group, at least one of R1to R3is a hydrophobic group, and two of R1to R3may be bonded to each other to form a ring with the nitrogen atom).

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