Resist composition

Details Resist composition Resist composition

2011-01-18

2011-01-18

Lee, Sin J. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S325000

Reexamination Certificate

active

07871751

ABSTRACT:
A radiation-sensitive composition containing a resist compound A, an acid generator B, and an acid crosslinking agent C. The resist compound A is (a) a polyphenol compound which is produced by the condensation of a C5-45aromatic ketone or aromatic aldehyde with a C6-15compound having from 1 to 3 phenolic hydroxyl groups, and, (b) its molecular weight is form 300 to 5000. The radiation-sensitive composition is solvent-soluble and exhibits a high sensitivity, high resolution, and high heat resistance.

REFERENCES:
patent: 5529885 (1996-06-01), Ochiai et al.
patent: 6045968 (2000-04-01), Ushirogouchi et al.
patent: 2004/0191672 (2004-09-01), Oguro et al.
patent: 2007/0059632 (2007-03-01), Oguro et al.
patent: 0 497 342 (1992-08-01), None
patent: 09-230593 (1997-09-01), None
patent: 2005-075767 (2005-03-01), None
patent: 2005-089387 (2005-04-01), None
Supplementary European Search Report dated Jan. 28, 2009, for Application No. EP 05 73 0470.
International Search Report, mailed Jul. 26, 2005, for Application No. PCT/JP2005/007226.

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