Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-02-10
1998-06-30
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430916, 430921, 430925, G03F 700
Patent
active
057731900
ABSTRACT:
Disclosed herein is a resist composition comprising in admixture (a) 100 parts by weight of an alkali-soluble phenolic resin, (b) 0.2-50 parts by weight of a compound which forms an acid upon exposure to active rays and consists of a specific halogen-containing aromatic compound, (c) 0.01-50 parts by weight of a compound which crosslinks the alkali-soluble phenolic resin in the presence of the acid formed from the compound (b), and (d) sufficient solvent to dissolve the foregoing composition components.
REFERENCES:
patent: 5234791 (1993-08-01), Dammel et al.
Abe Nobunori
Oie Masayuki
Tanaka Hideyuki
Duda Kathleen
Nippon Zeon Co. Ltd.
LandOfFree
Resist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Resist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Resist composition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1857372