Resins and photoresist compositions comprising same

Details Resins and photoresist compositions comprising same Resins and photoresist compositions comprising same

2007-07-17

2007-07-17

Ashton, Rosemary (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S905000

Reexamination Certificate

active

10448961

ABSTRACT:
Provided are new resins that comprise carbocyclic aryl units with hetero substitution units and photoresists that contain such resins. Particularly preferred photoresists of the invention comprise a deblocking resin that contains hydroxy naphthyl units and can be effectively imaged with sub-200 nm radiation such as 193 nm radiation.

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