Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1991-10-11
1993-06-01
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430283, 430285, 522102, 522109, G03F 7033
Patent
active
052158632
ABSTRACT:
Disclosed herein is a resin composition or a solder resist resin composition comprising an epoxy resin (A) and/or an epoxy acrylate (B) obtained by reacting one chemical equivalent of epoxy groups in an epoxy resin with 0.1 to 1.0 chemical equivalent of acrylic acid, a styrene-maleic anhydride copolymer (C), an unsaturated group-containing compound (D) other than (B), and a photopolymerization initiator (E).
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patent: 4601973 (1986-07-01), Bauer
WPIL, File Supplier, AN=88-054495, Derwent Publications Ltd., London, GB; (Mitsui Toatsu), Jan. 19, 1988.
WPIL, File Supplier, AN=86-116103, Derwent Publications Ltd., London, GB; (Mitsubishi), Mar. 22, 1986.
WPIL, File Supplier, AN=87-154194 Derwent Publications Ltd., London, GB; (Daicel), Apr. 27, 1987.
Nawata Kazuyoshi
Ohkubo Tetsuo
Yokoshima Minoru
McCamish Marion E.
Nippon Kayaku Kabushiki Kaisha
RoDee C. D.
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