Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-06-05
2007-06-05
Choi, Ling-Siu (Department: 1713)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S325000, C430S326000, C430S170000, C430S330000, C430S054000, C430S921000
Reexamination Certificate
active
10618068
ABSTRACT:
The present invention relates to a resin composition comprising: an alkali-soluble resin (A); an infrared absorbing agent (B); and a thiol compound (C), wherein a solubility thereof in an alkaline aqueous solution is changed by exposure with a infrared laser ray, and a positive or negative-type image recording layer containing the resin composition.
REFERENCES:
patent: 4436805 (1984-03-01), Iguchi et al.
patent: 54-092526 (1979-07-01), None
patent: 07-285275 (1995-10-01), None
patent: 11-020318 (1999-01-01), None
patent: 2000-241966 (2000-09-01), None
Endo Akihiro
Nakamura Ippei
Choi Ling-Siu
Fujifilm Corporation
Sughrue & Mion, PLLC
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