Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Removal of imaged layers
Reexamination Certificate
2005-05-03
2005-05-03
Schilling, Richard L. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Removal of imaged layers
C430S325000, C430S326000, C430S331000, C134S001300, C134S002000, C510S175000, C510S176000
Reexamination Certificate
active
06887654
ABSTRACT:
A composition and method to reduce or to prevent residue and scum formation on a substrate or in a solution. The composition contains an aromatic alkoxylate in combination with a polyol or ether or ester of a polyol. The composition also reduces or prevents foam formation such as in developing processes in the manufacturing of printed wiring boards.
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patent: 5922522 (1999-07-01), Barr et al.
patent: 6063550 (2000-05-01), Lundy et al.
patent: 6248506 (2001-06-01), Lundy et al.
patent: 20030099909 (2003-05-01), Takamiya
Anzures Edgardo
Barr Robert K.
Brady Edward J.
Lundy Daniel E.
Shelnut James G.
Piskorski John J.
Schilling Richard L.
Shipley Company L.L.C.
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