Residual gas removing device and method thereof

Details Residual gas removing device and method thereof Residual gas removing device and method thereof

2005-02-22

2005-02-22

Pham, Minh-Chau T. (Department: 1724)

Gas separation: processes

With recording or signaling condition

C095S090000, C096S108000, C096S417000

Reexamination Certificate

active

06858062

ABSTRACT:
A residual gas removing device for a gas supply apparatus in a semiconductor fabricating facility, includes a low stress valve disposed between a mass flow controller and a chamber. The low stress valve alternately supplies or cuts off a gas from the mass flow controller to the chamber. A WF6 gas removing apparatus is in flow communication with a gas inlet line of the low stress valve to remove a residual WF6 gas in the gas inlet line, before proceeding with a subsequent deposition step.

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