Residual gas analyzer of semiconductor device manufacturing...

Details Residual gas analyzer of semiconductor device manufacturing... Residual gas analyzer of semiconductor device manufacturing...

2005-04-19

2005-04-19

Lee, John R. (Department: 2881)

Radiant energy

Ionic separation or analysis

Static field-type ion path-bending selecting means

C250S281000, C250S282000, C250S299000, C324S464000

Reexamination Certificate

active

06881952

ABSTRACT:
In semiconductor manufacturing equipment having a residual gas analyzing apparatus for analyzing the composition of residual gas in a process chamber of the equipment a heater of the residual gas analyzer is interlocked with a heater of the process chamber. The residual gas analyzer includes an ion detector, and the heater of the residual gas analyzer has a filament and a heating jacket surrounding a portion of the ion detector. A relay connects a power source of the heater for the process chamber to the heater of the residual gas analyzer. Power is supplied to and cut off from the heater of the residual gas analyzer in response to heater on/off signals used for controlling the operation for the heater for the process chamber.

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patent: 6674068 (2004-01-01), Kammei

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