Removing solution, cleaning method for semiconductor...

Details Removing solution, cleaning method for semiconductor... Removing solution, cleaning method for semiconductor...

2007-12-25

2007-12-25

Whitehead, Jr., Carl (Department: 2813)

Semiconductor device manufacturing: process

Chemical etching

Liquid phase etching

C438S687000, C438S693000, C451S041000, C451S060000

Reexamination Certificate

active

10350185

ABSTRACT:
The removing solution containing a cerium (IV) nitrate salt, periodic acid or a hypochlorite can be applied to metals containing copper, silver or palladium and also to metals containing other metals having a relatively large oxidation-reduction potential.

REFERENCES:
patent: 5725414 (1998-03-01), Moinpour et al.
patent: 5958288 (1999-09-01), Mueller et al.
patent: 6117783 (2000-09-01), Small et al.
patent: 6127258 (2000-10-01), Watanabe et al.
patent: 6190237 (2001-02-01), Huynh et al.
patent: 6217416 (2001-04-01), Kaufman et al.
patent: 6245650 (2001-06-01), Watanabe
patent: 6376345 (2002-04-01), Ohashi et al.
patent: 6383065 (2002-05-01), Grumbine et al.
patent: 6475407 (2002-11-01), Ono
patent: 6527622 (2003-03-01), Brusic et al.
patent: 6589872 (2003-07-01), Twu et al.
patent: 6638143 (2003-10-01), Wang et al.
patent: 6706422 (2004-03-01), Inoue et al.
patent: 2002/0004360 (2002-01-01), Ota et al.
patent: 2002/0018896 (2002-02-01), Fukunaga et al.
patent: 2002/0077035 (2002-06-01), Wang et al.
patent: 2003/0116444 (2003-06-01), Basol
patent: 1055463 (2000-11-01), None
patent: 2001-237389 (2001-08-01), None
patent: 2001-345303 (2001-12-01), None
patent: WO 01/84621 (2001-11-01), None
Wolf, et al. Silicon Processing for the VLSI Era, vol. 1-Process Technology, 2nd ed., Lattice Press: Sunset Beach CA, 2000, pp. 761-762, 782-785.

Affiliated with

Also associated with

Rating

Removing solution, cleaning method for semiconductor... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Removing solution, cleaning method for semiconductor..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Removing solution, cleaning method for semiconductor... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3849128