Remover solution for photoresist

Details Remover solution for photoresist Remover solution for photoresist

1988-07-15

1990-02-27

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

430329, 252158, 252139, 427 96, G03C 174, G03C 516

Patent

active

049045717

ABSTRACT:
A remover solution for photoresist comprising (a) a solvent which is typically water, (b) an inorganic or organic alkaline compound such as sodium and potassium hydroxides, and (c) a borohydride compound such as sodium and lithium borohydrides and organic amine borane compounds. When used for removing patterned photoresist layer in the manufacturing process of, for example, electronic circuit board substrates. The method gives quite satisfactory results without discoloration or denaturation of the copper surface and solder surface, consequently leading to the production of high-quality products.

REFERENCES:
patent: 4517227 (1982-11-01), Cassat
patent: 4761303 (1986-11-01), Ruszezyk et al.

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