Removal of surface contaminants by irradiation using various met

Details Removal of surface contaminants by irradiation using various met Removal of surface contaminants by irradiation using various met

1994-11-09

1998-10-13

Bowers, Jr., Charles L.

Semiconductor device manufacturing: process

Radiation or energy treatment modifying properties of...

438906, 134 13, 134 1, B08B 312

Patent

active

058211756

ABSTRACT:
An apparatus and method for removing surface contaminants from a surface of a substrate provides a laminar flow of inert gas over the substrate surface while irradiating the substrate. The invention enables removal of surface contaminants without altering the underlying molecular crystal structure of the substrate. The source of high-energy irradiation includes a pulsed or continuous wave laser or high-energy lamp.

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