Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1982-03-25
1983-01-25
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
134 1, 134 30, 156646, 1566591, 156665, 204192E, 252 791, C23F 102, B08B 312, B08B 600, B08B 700
Patent
active
043701957
ABSTRACT:
An improvement in the etching of aluminum utilizing a carbon-containing etchant gas is provided whereby the residues remaining after etching are treated in a nitrogen glow discharge for a time effective in removing them or rendering them susceptible to removal by conventional means.
REFERENCES:
patent: 4243865 (1981-01-01), Saxena
patent: 4308089 (1981-12-01), Iida et al.
patent: 4325984 (1982-04-01), Galfo
Moran et al., J. Vac. Sci. Technol., vol. 19 (4), pp. 1127-1131, Nov./Dec. 1981.
Busta et al., 1977, I.E.E.E. Inter Electronic Devices Meeting Tech. Digest, Wash., D.C., pp. 12-15, (1977).
IBM Technical Disclosure Bulletin, vol. 21, No. 6, Nov. 1978, Plasma Removal of Residue Following Reactive Ion Etching of Aluminum and Aluminum Alloys by G. T. Chiu et al., p. 2315.
IBM Technical Disclosure Bulletin, vol. 21, No. 10, Mar. 1979, Cleaning of Permalloy Mask After Exposure to Chlorine Rie System by Zarowin, p. 4237.
Halon Bernard
Vossen, Jr. John L.
Morris Birgit E.
Powell William A.
RCA Corporation
Swope R. Hain
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