Removable shutter apparatus for a semiconductor process chamber

Details Removable shutter apparatus for a semiconductor process chamber Removable shutter apparatus for a semiconductor process chamber

1991-04-30

1993-06-29

Nguyen, Nam X.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429825, 20429815, C23C 1434

Patent

active

052231127

ABSTRACT:
Removable shutter apparatus for a deposition or etching apparatus including a shuttering mechanism disposed within a processing chamber and adapted to carry a shutter plate between a retracted position and an extended position wherein it is engaged by a lifting assembly and moved into position closing the normal plating aperture as if it were a substrate to be processed. When a new product substrate is presented for processing, the lifting assembly will lower the shutter plate back onto the shuttering mechanism and it will be moved to its retracted position out of the way of the normal handling and processing operation. Because the shutter plate is geometrically similar to the product substrate and is handled by the same lift assembly, the same robotic shuttling mechanism used to transport product substrates into and out of the chamber may be used to periodically remove and replace a used shutter plate with a new plate without shutting down the system. An important advantage of the present invention is that the shutter closes, and thus "shadows", exactly the same processing aperture closed by the substrate during its processing.

REFERENCES:
patent: 4548699 (1985-10-01), Hutchinson et al.
patent: 4718975 (1988-01-01), Bowling et al.
patent: 4756815 (1988-07-01), Turner et al.
patent: 4851101 (1989-07-01), Hutchinson

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