Relief pattern producing method and apparatus and relief pattern

Details Relief pattern producing method and apparatus and relief pattern Relief pattern producing method and apparatus and relief pattern

1995-05-01

1996-09-10

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Processing feature prior to imaging

430944, 430322, 430330, G03C 516

Patent

active

055544908

ABSTRACT:
A plurality of circular figures, each having the same diameter, are formed on a thermal expansile layer, made of a material which is foamed upon heating as a result of absorption of light, in such way that they are spaced at intervals more than 0.3 times as large as a diameter of each circular figure. Upon exposure of the figures to light, each circular figure absorbs light to produce heat. At this time, since the circular figures are formed with appropriate constant intervals between them, the circular figures are raised so as to have uniform size and shape without being affected by the light absorption and heat generation of other circular figures.

REFERENCES:
patent: 4371602 (1983-02-01), Iwasaki et al.
patent: 5122430 (1992-06-01), Nishitsuji et al.

Affiliated with

Also associated with

Rating

Relief pattern producing method and apparatus and relief pattern does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Relief pattern producing method and apparatus and relief pattern, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Relief pattern producing method and apparatus and relief pattern will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1319681