Registration and alignment technique for X-ray mask fabrication

Details Registration and alignment technique for X-ray mask fabrication Registration and alignment technique for X-ray mask fabrication

1995-06-06

1996-10-29

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 34, 2504923, G21K 500

Patent

active

055704050

ABSTRACT:
An X-ray mask includes one or more X-ray transparent mask windows and at least one pattern-to-mask alignment mark etched into the mask substrate from the same side as the mask windows. The pattern-to-mask alignment marks can be etched at the same time as the mask windows and are detectable from the front surface of the mask substrate by an electron beam lithography system prior to creating the circuit pattern. The alignment marks are detected by the absence of backscattered electrons at the pattern-to-mask alignment marks.

REFERENCES:
patent: 3742229 (1973-06-01), Smith et al.
patent: 3742230 (1973-06-01), Spears et al.
patent: 4152601 (1979-05-01), Kadota et al.
patent: 4260670 (1981-04-01), Burns
patent: 4370554 (1983-01-01), Bohlen
patent: 4451544 (1984-05-01), Kawabuchi
patent: 4785187 (1988-11-01), Kariya et al.
patent: 5262257 (1993-11-01), Fukuda et al.
patent: 5459001 (1995-10-01), Estes et al.

Affiliated with

Also associated with

Rating

Registration and alignment technique for X-ray mask fabrication does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Registration and alignment technique for X-ray mask fabrication, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Registration and alignment technique for X-ray mask fabrication will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1791266