Reflux annealing device and method

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156603, 156621, 156624, 156DIG72, 156DIG73, 156DIG82, 156DIG89, C30B 902

Patent

active

052599000

ABSTRACT:
Methods of annealing Hg.sub.1-x Cd.sub.x Te slices (56) in a mercury reflux chamber (32, 34) with a mercury reservoir (52) at the bottom and condensation regions at the top (62) is disclosed. The chamber is heated by a furnace (44) that creates an annealing region encompassing both the reservoir and a holder (46) for the Hg.sub.1-x Cd.sub.x Te slices (56). In preferred embodiment methods reservoir (52) is heated to 270.degree. C. for two hours to sixty days. An annealing immediately after LPE growth by use of either mercury vapor from the melt or a separate reservoir is also disclosed.

REFERENCES:
patent: 3619283 (1971-11-01), Carpenter et al.
patent: 4315477 (1982-02-01), Wang et al.
patent: 4317689 (1982-03-01), Bowers et al.
patent: 4401487 (1983-08-01), Lockwood
patent: 4462959 (1984-07-01), Tregilgas
patent: 4474640 (1984-10-01), War
patent: 4504334 (1985-03-01), Schaake et al.
patent: 4507160 (1985-03-01), Beck et al.
patent: 4536227 (1985-08-01), Brice et al.
patent: 4567849 (1986-02-01), War
Braun et al., "Diffusion of Gold and Mercury Self-Diffussion in N-Type Bridgman-Growth HgTeCd", J. Vac. Sci. Technol. A1(3), Jul.-Sep. 1983, pp. 1641-1644.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Reflux annealing device and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reflux annealing device and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reflux annealing device and method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1139891

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.