Reflector for generating a neutral beam and substrate...

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

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Details

C250S492100, C250S492200, C250S251000

Reexamination Certificate

active

07446325

ABSTRACT:
Example embodiments of the present invention provide a reflector for generating a neutral beam and a substrate processing apparatus including the same. The reflector may include at least one reflecting plate including a reflecting layer onto which an ion beam collides and a supporting layer. The reflecting layer may reflect and convert the ion beam into a neutral beam, and the supporting layer may reduce thermal deformation of the reflecting layer.

REFERENCES:
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patent: 5776253 (1998-07-01), Asakawa et al.
patent: 5795385 (1998-08-01), Asakawa et al.
patent: 5814150 (1998-09-01), Asakawa et al.
patent: 5993538 (1999-11-01), Asakawa et al.
patent: 6032611 (2000-03-01), Asakawa et al.
patent: 09-147787 (1997-06-01), None
patent: 10-2001-0102628 (2001-11-01), None
patent: 10-2002-0039840 (2002-05-01), None
patent: 1020030042958 (2003-06-01), None
patent: 10-2004-0033524 (2004-04-01), None
Korean Office Action dated Aug. 25, 2006.

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