Reflective surface for CVD reactor walls

Details Reflective surface for CVD reactor walls Reflective surface for CVD reactor walls

1998-07-06

2000-02-01

Dang, Thi

Coherent light generators

Particular resonant cavity

Specified cavity component

118620, 118641, 118715, 118724, H01S 308

Patent

active

060211520

ABSTRACT:
A reflector plate is provided for scattering radiant heat energy in a semiconductor processing reactor chamber to achieve uniform temperature across a substrate to be processed. The surface is characterized by a plurality of adjoining depressions with substantially no planar sections among the depressions. The width to depth ratio for the depressions averages over 3:1. Crests separating the depressions define an angle of greater than about 60.degree., thus providing a relatively smooth texture for the reflecting surface. The reflecting surface is thus easy to clean. A method of manufacturing the reflector plate comprises removing material from a planar metal surface by ball-end milling. The depth of each depression and degree of overlap with adjacent depressions can randomly vary within selected ranges. A highly specular finish is then provided on the stippled surface by gold electroplating.

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