Reflective reduction imaging optical system for X-ray lithograph

Details Reflective reduction imaging optical system for X-ray lithograph Reflective reduction imaging optical system for X-ray lithograph

1997-03-17

1999-06-29

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378210, G21K 500

Patent

active

059178795

ABSTRACT:
A reflective reduction imaging optical system for X-ray lithography achieves good imaging performance using a simple construction. The system includes, from the side of mask M, first concave mirror G.sub.4, plane mirror G.sub.3, convex mirror G.sub.2, and second concave mirror G.sub.1 are placed, in that sequence, from the object side. The concave mirrors G.sub.4 and G.sub.1 and the convex mirror G.sub.2 are formed in aspherical shapes. The convex mirror G.sub.2 is placed at the pupil plane and the system becomes telecentric on the image side of wafer W.

REFERENCES:
patent: 5220590 (1993-06-01), Bruning et al.
patent: 5315629 (1994-05-01), Jewell et al.

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