Reflective projection lens for EUV-photolithography

Details Reflective projection lens for EUV-photolithography Reflective projection lens for EUV-photolithography

2005-08-09

2005-08-09

Nguyen, Thong Q (Department: 2872)

Optical: systems and elements

Compound lens system

With curved reflective imaging element

C359S729000, C359S857000

Reexamination Certificate

active

06927901

ABSTRACT:
A projection lens for imaging a pattern arranged in an object plane onto an image plane using electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region has several imaging mirrors between its object plane and image plane that define an optical axis of the projection lens and have reflective coatings. At least one of those mirrors has a graded reflective coating that has a film-thickness gradient that is rotationally symmetric with respect to a coating axis, where that coating axis is acentrically arranged with respect to the optical axis of the projection lens. Providing at least one acentric, graded, reflective coating allows designing projection lenses that allow highly uniform field illumination, combined with high total transmittance.

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Stearns D.G. et al., “Multilayer Mirror Technology For Soft-X-Ray Projection Lithography”, Dec. 1, 1993 , Applied Optics vol. 32, No. 34, pp. 6952-6960.

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